Physical and electrochemical study of platinum thin films deposited by sputtering and electrochemical methods

C. Quiñones, W. Vallejo, F. Mesa

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

In this work platinum thin films deposited by sputtering and electrochemical methods were characterized through physical and electrochemical analysis. The as-grown platinum thin films were characterized through X-ray diffraction (XRD), atomic force microscopy (AFM); scanning electronic microscopy (SEM) and through electrochemical impedance spectroscopy (EIS) measurements. Structural studies indicated that platinum thin films were polycrystalline. Morphological characteristics were significantly affected by the substrate type and synthesis method. Finally the EIS analysis indicated that platinum films were electrochemically stable and present both low resistance of charge transfer and low series resistance; the equivalent circuit of platinum interface has been proposed.

Original languageEnglish (US)
Pages (from-to)7545-7550
Number of pages6
JournalApplied Surface Science
Volume257
Issue number17
DOIs
StatePublished - Jun 15 2011
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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