Physical and electrochemical study of platinum thin films deposited by sputtering and electrochemical methods

C. Quiñones, W. Vallejo, F. Mesa

Resultado de la investigación: Contribución a una revistaArtículorevisión exhaustiva

7 Citas (Scopus)

Resumen

In this work platinum thin films deposited by sputtering and electrochemical methods were characterized through physical and electrochemical analysis. The as-grown platinum thin films were characterized through X-ray diffraction (XRD), atomic force microscopy (AFM); scanning electronic microscopy (SEM) and through electrochemical impedance spectroscopy (EIS) measurements. Structural studies indicated that platinum thin films were polycrystalline. Morphological characteristics were significantly affected by the substrate type and synthesis method. Finally the EIS analysis indicated that platinum films were electrochemically stable and present both low resistance of charge transfer and low series resistance; the equivalent circuit of platinum interface has been proposed.

Idioma originalInglés estadounidense
Páginas (desde-hasta)7545-7550
Número de páginas6
PublicaciónApplied Surface Science
Volumen257
N.º17
DOI
EstadoPublicada - jun. 15 2011
Publicado de forma externa

Áreas temáticas de ASJC Scopus

  • Química (todo)
  • Física de la materia condensada
  • Física y astronomía (todo)
  • Superficies e interfaces
  • Superficies, recubrimientos y láminas

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