Structural, optical and morphological properties of Ga _1-xMn _xAs thin films deposited by magnetron sputtering for spintronic device applications

Compuestos químicos

• Optical Constant 93%
• Spintronics 84%
• Refraction 82%
• Magnetron Sputtering 74%
• Absorption Coefficient 72%
• Transmittance 64%
• Energy Dispersive X-Ray Spectroscopy 61%
• Atomic Force Microscopy 51%
• Semiconductor 49%
• Band Gap 48%
• Optical Property 47%
• Alloy 45%
• Glass 44%
• Crystal Structure 32%
• X-Ray Diffraction 31%
• Energy 30%
• Surface 20%
• Application 20%

Ingeniería y ciencia de los materiales

• Spintronics 100%
• Magnetron sputtering 86%
• Optical properties 80%
• Structural properties 69%
• Thin films 61%
• Diluted magnetic semiconductors 47%
• Substrates 45%
• Optical constants 38%
• Refraction 28%
• X-Ray Emission Spectrometry 27%
• Crystal structure 27%
• Atomic force microscopy 27%
• Energy gap 24%
• Surface morphology 24%
• Energy absorption 23%
• X ray diffraction 21%
• Glass 17%
• Temperature 8%

Física y astronomía

• magnetron sputtering 54%
• optical properties 41%
• thin films 33%
• energy absorption 24%
• refraction 19%
• x rays 19%
• absorptivity 18%
• transmittance 17%
• crystal structure 16%
• atomic force microscopy 16%
• glass 12%
• characterization 11%
• diffraction 11%
• spectroscopy 11%
• electronics 11%
• temperature 6%
• energy 6%