Electrical and morphological properties of low resistivity Mo thin films prepared by magnetron sputtering

G. Gordillo, F. Mesa, C. Calderón

Resultado de la investigación: Contribución a una revistaArtículorevisión exhaustiva

63 Citas (Scopus)

Resumen

Mo thin films have been deposited using a DC magnetron sputtering system with an S-gun configuration electrode and characterized electrically and morphologically. The influence of the sputtering gas pressure and glow discharge (GD) power, on the electrical resistivity of Mo thin films and on the contact resistivity of Mo to Cu(In,Ga)Se2 (CIGS) films was determined through an exhaustive parameter study. This study also allowed us to find the conditions to deposit Mo films with suitable properties for its use as back contact of solar cells based on CIGS. Resistivities smaller than 1×10 -4 Ω.cm and contact resistivities smaller than 0.3 Ωcm2 were found. Mo films with these characteristics are suitable for back contacts in solar cells based on CIGS. It was also found that the Mo thin films, deposited by DC magnetron sputtering on CIGS thin films, act effectively as ohmic contacts. The main contribution of this work was to obtain Mo thin films with adequate properties to be used as back contact for CIGS based solar cells using a DC sputtering system with S-gun configuration electrode, which allows growing the film with better surface quality and at a higher deposition rate than those deposited using the conventional planar RF sputtering system.

Idioma originalInglés estadounidense
Páginas (desde-hasta)982-985
Número de páginas4
PublicaciónBrazilian Journal of Physics
Volumen36
N.º3 B
DOI
EstadoPublicada - sept. 2006
Publicado de forma externa

Áreas temáticas de ASJC Scopus

  • Física y astronomía (todo)

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